EON R Shirt Multicam®

Size: M
Color: Multicam Tropic
Sale price$110.00 USD


EON R Shirt was designed based on the needs of military and law enforcement personnel to serve as an ideal base for tactical use in any operation. Featuring a unique multi-fabric construction, the EON R Shirt offers a flexible, agile base with moisture-wicking and quick-drying properties, plus durable ripstop sleeve sections that can withstand the harshest environments, while providing complete freedom of movement. Large shoulder pockets provide quick and convenient storage, mesh panels offer added breathability. When you need unhindered maneuverability and high performance, the EON R Shirt is the ideal choice.
  • U.S. made 6.5 oz. (185 grams.) NyCo MIL-DTL-44436B, Class 11 (Original Pattern) rip-stop Cordura® fabric.
  • Bionic-Finish® finish for stain resistance and water repellency.
  • 50% nylon/50% cotton fade resistant fabric and 85/15 Nylon/Spandex. 
  • Versatile 6” x 7” bicep pocket with original Velcro® hook and loop.
  • Velcro® hook and loop in cuffs.
  • YKK® placket behind frontal zipper.
  • Multiple compartment pockets.
  • Elbow protection pocket.
  • SK7® CORE-Way hybrid back with stretch mesh panels enhances freedom of movement and heat and moisture dissipation.
  • Base layer shirt designed to regulate body temperature, wick moisture, quick drying and anti-odor control.
  • Flat-seam construction and seamless top of shoulder helps prevent skin irritation.

MultiCam® patterns take advantage of the way the human eye and brain perceive shape, volume, and color. Since only a very small portion of the human eye perceives color, the brain does the "filling" for the eye. MultiCam®'s unique high-resolution design takes advantage of this principle and helps the viewer "see" the pattern as part of the background. The MultiCam® family of patterns relies more on a blending effect than a traditional contrasting effect to disguise the wearer. This effect allows them to perform well in a wide range of environmental conditions. It also helps maintain pattern effectiveness even at close intervals where low resolution patterns often stand out against the natural environment.

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